Semiconductor manufacturers are now employing a new “secret weapon” in the never ending quest for improved performance and yields. As 14 nm semiconductor production ramps up, elimination of process impurities become exponentially more critical. SilcoTek® high purity coatings solve the contamination problem by bonding high purity silicon to intricate surfaces in plasma etch systems like showerheads, fittings and tubing.
SilcoTek® coatings improve corrosion resistance 8x or more, preventing reactive etch gases from corroding flow path surfaces and ultimately contaminating the wafer surface.
Contamination of semicon etch streams is a potential major yield issue. Immersion of coated and uncoated 316 stainless steel coupons in highly corrosive hydrochloric acid demonstrates how quickly a process stream can become contaminated. The clear container shows no contamination while the green liquid shows severe leaching of metal ions after only 24 hours of exposure.
| SilcoTek coated | Uncoated |
SilcoTek® coatings are compatible with commonly used chemicals used in semicon manufacturing process streams. See the complete list:
Learn more about how SilcoTek coatings improve semiconductor yield.
SilcoTek's semiconductor R&D team has recently developed a modification to our Dursan® coating that is tailored specifically to semiconductor manufacturers. The carbon element of the original Dursan is almost fully removed, yielding a thin but durable silicon oxide (SiO) layer that prevents both erosion and corrosion in manufacturing processes.