Corrosion Resistant Silicon Coatings for Improved Semiconductor Manufacturing

 
Improve yields by preventing metal ion leaching, corrosion, and surface reactivity in semiconductor manufacturing equipment. 
 
 
• Dursox™: corrosion and erosion resistant silicon oxide
 
• Silcolloy®: high-purity amorphous silicon

 

Application Benefits

 

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  • Etch: – Eliminate ion contamination in corrosive etch gas streams

  • Atomic Layer Deposition (ALD): – Maintain ultimate purity by coating exposed surfaces of all chambers and equipment. Reduces carryover and corrosion

  • Epitaxy: – Significantly reduce contamination and maintenance caused by corrosion

  • Ozone: – Stabilize flow path to assure ozone purity

  • Gas Transfer – Prevent ion contamination, assure high purity of gases, eliminate surface reaction

  • Chemical-Mechanical Planarization (CMP): Increase lubricity, prevent sticking and cut downtime

 

Data - The Proof is in the Performance

Dramatically increase system lifetime without failure by coating gas delivery systems with our corrosion resistant, amorphous silicon-based coatings. 


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Improve yields by completely shielding metal equipment from the process stream with an ultra-thin (<1µm), inert silicon coating that substantially outperforms yttria and other ceramic coatings.



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Want to learn more?  Complete the form to download our presentation from ASMC 2017 to get a comprehensive overview of our coating technology and solutions for semiconductor manufacturing applications.  

Learn more by downloading our presentation from the Advanced Semiconductor Manufacturing Conference (ASMC) 2017:



SilcoTek ASMC 2017 Presentation

 

 

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