Corrosion Resistant, High Purity Coatings For Semiconductor and PV Applications

Silcolloy high purity coating In many purity-critical applications the potential for contamination created by contact of the process stream with sample transfer components such as tubing, fittings, and valves is a major concern. For example, the slightest contamination in gases used in manufacturing semi-conductor devices can create high failure rates in end products.

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New Dursox™ and Silcolloy high purity barrier coatings can eliminate interactions between process gases and transfer system components. Our extensive evaluations in the fields of passivation, corrosion resistance, and ultra-high vacuum show SilcoTek® coatings eliminate outgassing of impurities into the sample stream and will not react with process stream components.

Dursox and Silcolloy® are resistant to many corrosives used in the semiconductor and PV industry.

Chemicals List

Chemical Compatibility Rating
    Excellent Good Poor
2-Propanol C3H8O    
Acetic Acid C2H4O2    
Acetone C3H6O    
Ammonia NH3    
Ammonium Flouride NH4F    
Ammonium Hydroxide NH4OH    
Argon Ar    
Arsine AsH3    
Boron Tribromide BBr3    
Boron Trichloride BCL3    
Carbon Dioxide CO2    
Carbon Tetraflouride CF4    
Chlorine CL    
Dichloromethane (methylene chloride) CH2CL2    
Disilane Si2H6    
Helium He    
Hexafluoroethane C2F6    
HMDS C6H19Si2N    
Hydrochloric Acid HCL    
Hydrofluoric Acid HF    
Hydrogen H2    
Hydrogen Bromide HBr    
Hydrogen Peroxide H2O2    
Methanol CH3OH    
Nitric Acid HNO3    
Nitrogen N2    
Nitrogen Trifluoride NF3    
n-Methyl 2-Pyrrolidone C5H9NO    
Octafluorocyclobutane C4F8    
Oxygen O2    
Ozone O3    


Phosphoric Acid H3PO4    
Phosphoric Oxychloride POCL3    
Potassium Hydroxide KOH    
Silane SiH4    
Sulfur Hexafluoride SF6    
Sulfuric Acid H2SO4    
Tungsten Hexaflouride WF6    
Water H2O    
DI Water H20    


Dursox™ is made for next generation semiconductor manufacturing systems

  • Etch:
    • Dursox high purity coating eliminates ion contamination in corrosive etch gas streams
  • Atomic Layer Deposition (ALD):
    • Dursox enhances purity by coating of all chambers and equipment. Reduces carryover and corrosion
  • Epitaxy:
    • Dursox significantly reduces contamination and maintenance caused by corrosion
  • Ozone:
    • Stabilize flow path to assure ozone purity
  • Gas Transfer:
    • Prevent ion contamination, assure high purity gases
  • Chemical-Mechanical Planarization (CMP):
    • Increase lubricity, prevent sticking and cut downtime


SilcoTek® Surface Treatments
SilcoTek passivation and surface protection layers are deposited using a chemical vapor deposition (CVD) process in which the item to be treated is heated under vacuum. Our current capacity enables us to treat items up to 6 feet long, or continuous lengths of coiled tubing exceeding 2000 feet (600 meters). Items that can be evacuated, such as gas chambers, can have a volume of up to 43 cubic feet.

When the item has been heated to the appropriate temperature, the reacting gases that form the protective surface are introduced, depositing a durable, amorphous silicon layer that grows and overlays itself multiple times. The reaction layer penetrates into the lattice of the treated piece and binds solidly. Consequently, it is possible to work a piece, such as bending a length of treated tubing, without creating cracks, flakes, or other flaws in the layer. By controlling the variables in the process, we control the layer type and thickness. Layer thickness ranges from 0.03µm to 1.5µm, controlled to our specifications.

All coatings are applied to customer supplied items on a custom basis.

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